Pyrometrické měření teploty substrátu během plazmochemické depozice

Mgr. Roman Petráš

Bachelor's thesis

Pyrometric Measurements of Substrate Temperature during Plasmachemical Deposition

Abstract:

This work deals with non-contact pyrometric temperature measurement of surfaces in a contact with plasma. Two different pyrometers were employed for the experiments depending on the temperature range, i.e. below or above 500°C. It was found that the silicon is transparent in the spectral range of the pyrometers. The correct values of the emissivity were determined from the known silicon optical constants and by measuring transmittance and reflectance in infrared range. It was shown that approximation of the silicon emissivity with the pyrometer is not possible and that the pyrometer measures the temperature of the silicon holder. The temperature dependence of the angle under which the pyrometer was placed during the plasmachemical deposition was determined experimentally. The temperature of the substrate holder during the deposition of ultrananocrystalline diamond films in the microwave plasma reactor of ASTeX type was measured by the high temperature pyrometer for different deposition pressures.

Abstract:

Táto práca sa zaoberá bezkontaktným pyrometrickým meraným teploty povrchov v kontakte s plazmou. V priebehu experimentov boli použité dva rôzne pyrometre v závislosti od rozsahu teplôt, tzn. pod, alebo nad 500°C. Zistilo sa, že kremíky sú priepustné pre vlnové rozsahy pyrometrov. Správne hodnoty emisivity boli stanovené zo známych optických konštánt na základe meraní priepustnosti a odrazivosti v infračervenej oblasti. Ukázalo sa, že určenie emisivity kremíkov pyrometrom nie je možné, a že pyrometer meria teplotu držiaku, na ktorom bol kremík umiestnený. Teplotná závislosťuhla, pod ktorým bol pyrometer umiestnený počas plazmochemických depozícií bola stanovená experimentálne. Teplota držiaku počas depozícii ultrananokryštalických diamantových vrstiev v mikrovlnnom plazmovom reaktore Astex bola meraná vysokoteplotným pyrometrom za rôznych tlakov.

Keywords

Meranie teploty, pyrometer, emisivita, PECVD, nanokryštalický diamant, Temperature measurement, emissivity, plasma enhanced chemical vapor deposition, nanocrystalline diamond

Language used: Slovak

Date on which the thesis was submitted / produced: 20. 5. 2011

Thesis defence

• Date of defence: 24. 6. 2011
• Supervisor: doc. Mgr. Lenka Zajíčková, Ph.D.

Masaryk University

Faculty of Science

Bachelor programme / field:
Physics / Physics